Materials
Symposium

Dr. Nelson Felix


Dr. Nelson M. Felix is current manager of the Foundational Patterning group at IBM’s Semiconductor Technology Research center in Albany, NY. He received his B.S. from the University of Massachusetts, Amherst (2002) and his Ph.D. from Cornell University (2007), both in chemical engineering, and his doctoral work centered on the characterization of novel molecular photoresist materials. After initial research work in novel photoresist materials and processes, he began working at IBM East Fishkill as a development engineer for overlay and CD metrology applications, and eventually managed a development group tasked with controlling lithography variation. Since moving to Albany, Dr. Felix has been focused on all elements to enable EUV lithography, including tooling, materials, and mask infrastructure. Dr. Felix has co-authored over 80 papers and is currently a holder of 6 patents.